Optics: measuring and testing – By light interference – Having wavefront division
Reexamination Certificate
2008-07-22
2008-07-22
Connolly, Patrick J (Department: 2877)
Optics: measuring and testing
By light interference
Having wavefront division
C356S497000
Reexamination Certificate
active
07403293
ABSTRACT:
A metrology apparatus for measuring a parameter of a microscopic structure on a substrate, the apparatus comprising a supercontinuum light source arranged to generate a measurement beam, an optical system arranged to direct the measurement beam onto the substrate and a sensor for detecting radiation reflected and/or diffracted by the structure.
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Corbeij Wilhelmus Maria
Den Boef Arie Jeffrey
Pellemans Henricus Petrus Maria
Van Der Laan Hans
ASML Netherlands
Connolly Patrick J
Pillsbury Winthrop Shaw & Pittman LLP
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