Metrology apparatus, lithographic apparatus, process...

Optics: measuring and testing – By light interference – Having wavefront division

Reexamination Certificate

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C356S497000

Reexamination Certificate

active

07403293

ABSTRACT:
A metrology apparatus for measuring a parameter of a microscopic structure on a substrate, the apparatus comprising a supercontinuum light source arranged to generate a measurement beam, an optical system arranged to direct the measurement beam onto the substrate and a sensor for detecting radiation reflected and/or diffracted by the structure.

REFERENCES:
patent: 5703692 (1997-12-01), McNeil et al.
patent: 5880838 (1999-03-01), Marx et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6608690 (2003-08-01), Niu et al.
patent: 6699624 (2004-03-01), Niu et al.
patent: 6704661 (2004-03-01), Opsal et al.
patent: 6721691 (2004-04-01), Bao et al.
patent: 6738138 (2004-05-01), Wei
patent: 6753961 (2004-06-01), Norton et al.
patent: 6768983 (2004-07-01), Jakatdar et al.
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6813034 (2004-11-01), Rosencwaig et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6856408 (2005-02-01), Raymond
patent: 6919964 (2005-07-01), Chu
patent: 6928628 (2005-08-01), Seligson et al.
patent: 6972852 (2005-12-01), Opsal et al.
patent: 6974962 (2005-12-01), Brill et al.
patent: 6987572 (2006-01-01), Lakkapragada et al.
patent: 7046376 (2006-05-01), Sezginer
patent: 7061615 (2006-06-01), Lowe-Webb
patent: 7061623 (2006-06-01), Davidson
patent: 7061627 (2006-06-01), Opsal et al.
patent: 7068363 (2006-06-01), Bevis et al.
patent: 2002/0030826 (2002-03-01), Chalmers et al.
patent: 2003/0214730 (2003-11-01), Wang et al.
patent: 2004/0119970 (2004-06-01), Dusa et al.
patent: 2005/0099627 (2005-05-01), Zhao et al.
patent: 2006/0033921 (2006-02-01), Den Boef et al.
patent: 2006/0066855 (2006-03-01), Den Boef et al.
patent: 2006/0126074 (2006-06-01), Van Der Werf et al.
patent: 2006/0139592 (2006-06-01), Den Boef et al.
patent: 2006/0158659 (2006-07-01), De Lega et al.
patent: 1 455 235 (2004-09-01), None
patent: 1455235 (2004-09-01), None
Teipel et al., “Characteristics of Supercontinuum Generation in Tapered Fibers Using Femtosecond Laser Pulses,” Appl. Phy. B 77, pp. 245-251 (2003).
Fink et al., “Advanced Technologies for Optical Frequency Control and Optical Clocks,” Muri-Technology for Optical Frequency Control and Optical Clocks, (2003), 35 pgs.
Giessen, Ultrafast Nano-Optics, Generation of Whitelight Supercontinua in Tapered Optical Fibers, Apr. 17, 2005, 3 pages including Abstract.
www.imra.com, Femtolite Series Annexed as mht 3.1 and mht 3.2, Femtolite Series—“A” Model, Femtolite Series—“B” Model, Femtolite Series—“C” Model, Femtolite Series-Tunable, Femtolite Series-Supercontinuum, 19 pages.
Bouwhuis, G., et al., Principles of Optical Disc Systems, (1985), The Complex Amplitude Grating, Sections 2.2.3, pp. 16-23; Numerical Results, Section 2.3.4, pp. 38-49.
European Search Report issued in EP Appl. No. 06 25 3180 dated Oct. 16, 2006.

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