Methylene chloride-methane sulfonic acid stripping compositions

Details Methylene chloride-methane sulfonic acid stripping compositions Methylene chloride-methane sulfonic acid stripping compositions

1981-12-23

1984-01-17

Kittle, John E.

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

252162, 252171, 252DIG8, 430329, 134 3, 134 38, C11D 708, C11D 752

Patent

active

044263112

ABSTRACT:
Methylene chloride-methane sulfonic acid compositions used in removing polymeric organic substances from inorganic substrates, such as polymeric adhesives from metal and lense glass parts and positive and negative photoresists from metallized silicon/silicon dioxide wafers, which comprise an effective amount, usually about 1 to 40 percent by weight methane sulfonic acid and the balance methylene chloride are described. Methods for using the above composition at ambient temperatures to remove the polymeric organic substances from the metal and non-metallic inorganic substrates are also described.

REFERENCES:
patent: 3391084 (1968-07-01), York
patent: 3762952 (1973-10-01), Gouin et al.
patent: 3789007 (1974-01-01), Robinson
patent: 4165295 (1979-08-01), Vander Mey

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