Methods of stabilizing measurement of ArF resist in CD-SEM

Details Methods of stabilizing measurement of ArF resist in CD-SEM Methods of stabilizing measurement of ArF resist in CD-SEM

2006-03-21

2006-03-21

Berman, Jack I. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Methods

C250S310000

Reexamination Certificate

active

07015468

ABSTRACT:
A method of improving stability for CD-SEM measurements of photoresist, in particular 193 nm photoresist, and of reducing shrinkage of 193 nm photoresist during CD-SEM measurements.The photoresist is exposed to a dose of electrons or other stabilizing beam prior to or during CD measurement. One embodiment of the invention includes multiplexing of the SEM electron beam.

REFERENCES:
patent: 6066849 (2000-05-01), Masnaghetti
patent: 6730458 (2004-05-01), Kim et al.
patent: 6774044 (2004-08-01), Ke et al.

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