Methods of selectively growing nickel-containing materials

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C438S622000

Reexamination Certificate

active

08062969

ABSTRACT:
The invention includes methods of electroless plating of nickel selectively on exposed conductive surfaces relative to exposed insulative surfaces. The electroless plating can utilize a bath which contains triethanolamine, maleic anhydride and at least one nickel salt.

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Baudrand, “Electroless Nickel Plating Surface Engineering”, ASM Handbook vol. 5, pp. 290-310.
Kondo et al., “Acceleration of Electroless Copper Deposition in the Presence of Excess Triethanolamine”, The Electrochemical Society, Inc., 1991, pp. 3629-3633.

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