Methods of sampling halosilanes for metal analytes

Chemical apparatus and process disinfecting – deodorizing – preser – Analyzer – structured indicator – or manipulative laboratory... – Means for analyzing gas sample

Reexamination Certificate

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C422S088000, C436S073000, C436S077000, C436S083000, C436S084000, C436S100000, C436S101000, C436S124000, C436S125000, C436S173000, C436S181000

Reexamination Certificate

active

10622015

ABSTRACT:
Methods for determining the amount of at least one metal analyte present in a liquid or gas sample of a halosilane supply (e.g., a chlorosilane supply) are disclosed herein. A sample of a halosilane supply is contacted and reacted with an aqueous hydrofluoric acid solution to produce a liquid reaction mixture. Liquid from the liquid reaction mixture is evaporated under controlled temperature and pressure conditions to near dryness. The nearly-dry residue is prepared for spectral analysis. The presence of a detectable amount of at least one metal analyte is determined for the sample.

REFERENCES:
patent: 4481178 (1984-11-01), Kray
patent: 4529707 (1985-07-01), Cowles et al.
patent: 5723644 (1998-03-01), Tzou
Abstract from article entitled “ICP Emission Spectroscopy Determination of Trace Amounts of Manganese, Iron, Chromium, Vanadium, Titanium, Copper, Nickel and Cobalt”, Fenxi Huaxue, vol. 8(1), 1980, pp. 44-48.
Chen et al., “Spectrophotometric Determination of Trace and Ultratrace Levels of Boron in Silicon and Chlorosilane Samples,”Fresenius J. Anal. Chem., 340:357-362, 1991.
Cowles and Bollinger, “Point-of-Use Sampling and Metal Analysis for Trichlorosilane,”SEMI Technical Symposium(STS): Innovations in Semiconductor Manufacturing, Jul. 2002.
Stolyarova and Orlova, “Trichlorosilane and Silicon Tetrachloride Sample Preparation for Trace Boron, Phosphorus, and Arsenic Determination,”J. Anal. Chem., 50(2):130-134. 1995.
Wei and Yang, “Determination of Phosphorus and Arsenic in Trichlorosilane by Electrothermal Vaporization-Inductively Coupled Plasma Mass Spectrometry with Prior Concentration by Cuprous Chloride,”Fresenius J. Anal. Chem., 353:167-170, 1995.
Presentation of POU Sampling and Metal Analysis of Trichlorosilane at SEMI Semiconductor Equipment and Materials International, Jul. 2002.

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