Etching a substrate: processes – Nongaseous phase etching of substrate
Reexamination Certificate
2006-11-02
2008-07-22
Ahmed, Shamim (Department: 1792)
Etching a substrate: processes
Nongaseous phase etching of substrate
C216S041000, C216S052000, C216S088000, C216S089000, C438S745000, C438S905000, C438S906000, C134S001200, C134S002000, C134S003000, C134S022100, C134S026000
Reexamination Certificate
active
07402258
ABSTRACT:
Methods of removing metal contaminants from a component for a plasma processing apparatus are provided. The method includes cleaning a surface of the component with a cleaning liquid that includes at least one acid selected from oxalic acid, formic acid, acetic acid, citric acid, and mixtures thereof.
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Daugherty John E.
Kiehlbauch Mark W.
Singh Harmeet
Ahmed Shamim
Buchanan & Ingersoll & Rooney PC
Lam Research Corporation
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