Methods of producing a laminate

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

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20419226, 427577, 4274192, C23C 1434

Patent

active

059420901

ABSTRACT:
A method for forming an oxide film on a substrate by a sputtering process using a target comprising a metal as the main component, wherein sputtering is carried out in an atmosphere which contains a gas containing carbon atoms.

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B.E. Kempf, et al., Materials Research Society Symp. Proc., vol.354, pp. 529-534, 1995, "Ion Beam Sputter Deposition Of Refractory Metal Oxides".
J. L. Vossen, et al., J. Vac. Sci. Technol. A, vol. 9, No. 3, pp. 600-603, May 1991, "Some Experiments That provide Direct Visualization of Reactive Sputtering Phenomena".

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