Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-04-11
1999-08-24
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, 427577, 4274192, C23C 1434
Patent
active
059420901
ABSTRACT:
A method for forming an oxide film on a substrate by a sputtering process using a target comprising a metal as the main component, wherein sputtering is carried out in an atmosphere which contains a gas containing carbon atoms.
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B.E. Kempf, et al., Materials Research Society Symp. Proc., vol.354, pp. 529-534, 1995, "Ion Beam Sputter Deposition Of Refractory Metal Oxides".
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Aomine Nobutaka
Ebisawa Junichi
Hayashi Yasuo
Takaki Satoru
Asahi Glass Company Ltd.
Nguyen Nam
Raghuveer Brinda
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