Methods of manufacturing thin film transistors using masks...

Details Methods of manufacturing thin film transistors using masks... Methods of manufacturing thin film transistors using masks...

2007-04-17

2007-04-17

Smoot, Stephen W. (Department: 2813)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C257S066000

Reexamination Certificate

active

11029335

ABSTRACT:
A method of manufacturing a thin film transistor includes forming a semiconductor layer on a substrate; forming a gate insulating layer over the entire surface of the substrate to cover the semiconductor layer; depositing a conductive layer on the gate insulating layer; forming a first photosensitive pattern over the conductive layer; patterning the conductive layer according to the photosensitive pattern to form a gate electrode; and ion-doping an impurity into the semiconductor layer using the photosensitive pattern as a mask to form source and drain regions.

REFERENCES:
patent: 5504020 (1996-04-01), Aomori et al.
patent: 5543636 (1996-08-01), Yamazaki
patent: 5576229 (1996-11-01), Murata et al.
patent: 5580800 (1996-12-01), Zhang et al.
patent: 5763904 (1998-06-01), Nakajima et al.
patent: 5837568 (1998-11-01), Yoneda et al.
patent: 6017783 (2000-01-01), Yamazaki et al.
patent: 6051452 (2000-04-01), Shigyo et al.
patent: 6143659 (2000-11-01), Leem
patent: 6174757 (2001-01-01), Yamaguchi et al.
patent: 6221701 (2001-04-01), Yamazaki
patent: 6277678 (2001-08-01), Lee
patent: 6317185 (2001-11-01), Harano et al.
patent: 7046321 (2006-05-01), Kikkawa et al.
patent: 07-058337 (1995-03-01), None
patent: 09-160072 (1997-06-01), None
patent: 2001-274413 (2001-10-01), None
patent: 0200706 (1999-03-01), None
Stanley Wolf and Richard N. Tauber, “Silicon Processing for the VLSI Era—vol. 1: Process Technology,” Lattice Press, Sunset Beach, California (1986), pp. 407-409, 518-519.
U.S. Appl. No. 10/166,367, filed Jun. 11, 2002, Sang-il Park et al.
Office Action from Chinese Patent Office issued Apr. 26, 2004 re: Chinese Patent Application No. 02152723.7.

Affiliated with

Also associated with

Rating

Methods of manufacturing thin film transistors using masks... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods of manufacturing thin film transistors using masks..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods of manufacturing thin film transistors using masks... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3765938