Methods of manufacturing image sensors

Details Methods of manufacturing image sensors Methods of manufacturing image sensors

2011-07-05

2011-07-05

Chaudhari, Chandra (Department: 2891)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S200000, C257SE21352

Reexamination Certificate

active

07972890

ABSTRACT:
Example embodiments may provide methods of manufacturing an image sensor. Example methods of manufacturing an image sensor may include forming a photoelectric converter in a semiconductor substrate, forming an interlayer insulating film covering a surface of the semiconductor substrate, forming metal wires and an inter-metal insulating film filling between the metal wires on the interlayer insulating film, forming openings above the photoelectric converter by removing a part of the inter-metal insulating film and the interlayer insulating film, curing the surface above the photoelectric converter by irradiating light into the openings, and/or forming a light transmitter filling the openings.

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Korean Office Action dated Aug. 29, 2007.

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