Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Reexamination Certificate
2006-11-07
2006-11-07
Gilliam, Barbara L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
C430S005000, C430S311000, C430S320000, C430S322000, C356S237100, C356S237500, C382S152000
Reexamination Certificate
active
07132225
ABSTRACT:
A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.
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Brooks Kenneth C.
Gilliam Barbara L.
Molecular Imprints, Inc.
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