Methods of forming stacked semiconductor devices with...

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Subsequent separation into plural bodies

Reexamination Certificate

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C438S152000, C438S455000, C257SE21162, C257SE21482, C257SE21507

Reexamination Certificate

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07932163

ABSTRACT:
Spaced apart bonding surfaces are formed on a first substrate. A second substrate is bonded to the bonding surfaces of the first substrate and cleaved to leave respective semiconductor regions from the second substrate on respective ones of the spaced apart bonding surfaces of the first substrate. The bonding surfaces may include surfaces of at least one insulating region on the first substrate, and at least one active device may be formed in and/or on at least one of the semiconductor regions. A device isolation region may be formed adjacent the at least one of the semiconductor regions.

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Fontcuberta i Morral et al. “Spectroscopic studies of the mechanism for hydrogen-induced exfoliation of InP,” Physical Review, B 72, pp. 085219-1 through 085219-8 (2005).

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