Methods of forming quantum dots of Group IV semiconductor...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C252S30160F, C423S348000

Reexamination Certificate

active

06794265

ABSTRACT:

FIELD OF THE INVENTION
This invention relates generally to methods of forming quantum dots. More particularly, this invention relates to methods of forming quantum dots of Group IV semiconductor materials.
BACKGROUND OF THE INVENTION
Over the past several years, there has been an increasing interest in exploiting the extraordinary properties associated with quantum dots. As a result of quantum confinement effects, properties of quantum dots can differ from corresponding bulk values. These quantum confinement effects arise from confinement of electrons and holes along three dimensions. For instance, quantum confinement effects can lead to an increase in energy gap as the size of the quantum dots is decreased. Consequently, as the size of the quantum dots is decreased, light emitted by the quantum dots is shifted towards higher energies or shorter wavelengths. By controlling the size of the quantum dots as well as the material forming the quantum dots, properties of the quantum dots can be tuned for a specific application.
Previous attempts at forming quantum dots have largely focused on quantum dots of direct band gap semiconductor materials, such as Group II-VI semiconductor materials. In contrast to such direct band gap semiconductor materials, Group IV semiconductor materials such as Si and Ge have energy gaps, chemical properties, and other properties that render them more desirable for a variety of applications. However, previous attempts at forming quantum dots of Si or Ge have generally suffered from a number of shortcomings. In particular, formation of quantum dots of Si or Ge sometimes involved extreme conditions of temperature and pressure while suffering from low yields and lack of reproducibility. And, quantum dots that were produced were generally incapable of exhibiting adequate levels of photoluminescence that can be tuned over a broad spectral range. Also, previous attempts have generally been unsuccessful in producing quantum dots of Si or Ge that are sufficiently stable under ambient conditions or that can be made sufficiently soluble in a variety of matrix materials.
It is against this background that a need arose to develop the quantum dots and methods for forming quantum dots described herein.
SUMMARY OF THE INVENTION
In one innovative aspect, the present invention relates to a method of forming a quantum dot. In one embodiment, the method comprises providing a particle that includes a semiconductor material Y selected from the group consisting of Si and Ge. The method also comprises applying sound energy and light energy to the particle to form a quantum dot that exhibits photoluminescence with a quantum efficiency that is greater than 10 percent. The quantum dot includes a core, and the core includes Y.
In another embodiment, the method comprises reacting, in a reaction medium, a source of a semiconductor material Y selected from the group consisting of Si and Ge with a reducing agent to form a particle that includes a core. The core includes Y, and the reducing agent is selected from the group consisting of Group IIA metals, transition metals, and lanthanides. The method also comprises reacting the particle with a source of surface ligands to form a ligand layer surrounding the core to form a quantum dot. The ligand layer includes at least one surface ligand.
In another innovative aspect, the present invention relates to a method of forming quantum dots. In one embodiment, the method comprises providing particles having a first peak size. The particles include a semiconductor material Y selected from the group consisting of Si and Ge. The method also comprises applying light energy to the particles for a time sufficient to form quantum dots having a second peak size. The second peak size is smaller than the first peak size.


REFERENCES:
patent: 3995311 (1976-11-01), Taylor
patent: 4211467 (1980-07-01), Cross et al.
patent: 4332974 (1982-06-01), Fraas
patent: 4557551 (1985-12-01), Dyott
patent: 4688882 (1987-08-01), Failes
patent: 4693547 (1987-09-01), Soref et al.
patent: 4818050 (1989-04-01), Duthie
patent: 4856859 (1989-08-01), Imoto
patent: 4894818 (1990-01-01), Fujioka et al.
patent: 4906064 (1990-03-01), Cheung
patent: 4962987 (1990-10-01), Doran
patent: 4973122 (1990-11-01), Cotter et al.
patent: 5079594 (1992-01-01), Mitsuyu et al.
patent: 5136669 (1992-08-01), Gerdt
patent: 5147841 (1992-09-01), Wilcoxon
patent: 5191630 (1993-03-01), Tajima
patent: 5253103 (1993-10-01), Boyd et al.
patent: 5260957 (1993-11-01), Hakimi et al.
patent: 5262357 (1993-11-01), Alivisatos et al.
patent: 5291034 (1994-03-01), Allam et al.
patent: 5307428 (1994-04-01), Blow et al.
patent: 5406407 (1995-04-01), Wolff
patent: 5432873 (1995-07-01), Hosoya et al.
patent: 5449561 (1995-09-01), Golding et al.
patent: 5449582 (1995-09-01), Hsieh et al.
patent: 5459801 (1995-10-01), Snitzer
patent: 5460701 (1995-10-01), Parker et al.
patent: 5477377 (1995-12-01), Golding et al.
patent: 5491114 (1996-02-01), Goldstein
patent: 5493433 (1996-02-01), Prucnal et al.
patent: 5496503 (1996-03-01), Kurihara et al.
patent: 5500054 (1996-03-01), Goldstein
patent: 5505928 (1996-04-01), Alivisatos et al.
patent: 5527386 (1996-06-01), Statz
patent: 5535001 (1996-07-01), Tajima
patent: 5537000 (1996-07-01), Alivisatos et al.
patent: 5546480 (1996-08-01), Leonard
patent: 5559057 (1996-09-01), Goldstein
patent: 5559825 (1996-09-01), Scalora et al.
patent: 5576248 (1996-11-01), Goldstein
patent: 5580655 (1996-12-01), El-Shall et al.
patent: 5592319 (1997-01-01), Lee et al.
patent: 5594818 (1997-01-01), Murphy
patent: 5636309 (1997-06-01), Henry et al.
patent: 5642453 (1997-06-01), Margulis et al.
patent: 5646759 (1997-07-01), Lichtman et al.
patent: 5647040 (1997-07-01), Modavis et al.
patent: 5670279 (1997-09-01), Goldstein
patent: 5686351 (1997-11-01), Golding et al.
patent: 5690807 (1997-11-01), Clark, Jr. et al.
patent: 5695617 (1997-12-01), Graiver et al.
patent: 5710845 (1998-01-01), Tajima
patent: 5711803 (1998-01-01), Pehnt et al.
patent: 5728195 (1998-03-01), Eastman et al.
patent: 5737102 (1998-04-01), Asher
patent: 5740287 (1998-04-01), Scalora et al.
patent: 5811030 (1998-09-01), Aoki
patent: 5825519 (1998-10-01), Prucnal
patent: 5834378 (1998-11-01), Kurtz et al.
patent: 5840111 (1998-11-01), Wiederhoff et al.
patent: 5840562 (1998-11-01), Diep et al.
patent: 5850064 (1998-12-01), Goldstein
patent: 5854868 (1998-12-01), Yoshimura et al.
patent: 5881200 (1999-03-01), Burt
patent: 5888885 (1999-03-01), Xie
patent: 5897331 (1999-04-01), Sopori
patent: 5932309 (1999-08-01), Smith et al.
patent: 5959753 (1999-09-01), Duling, III et al.
patent: 5963360 (1999-10-01), Sato et al.
patent: 5963571 (1999-10-01), Wingreen
patent: 5990479 (1999-11-01), Weiss et al.
patent: 6005707 (1999-12-01), Berggren et al.
patent: 6026205 (2000-02-01), McCallion et al.
patent: 6049090 (2000-04-01), Clark, Jr.
patent: 6058127 (2000-05-01), Joannopoulos et al.
patent: 6060026 (2000-05-01), Goldstein
patent: 6064506 (2000-05-01), Koops
patent: 6074742 (2000-06-01), Smith et al.
patent: 6075203 (2000-06-01), Wang et al.
patent: 6075915 (2000-06-01), Koops et al.
patent: 6084176 (2000-07-01), Shiratsuchi et al.
patent: 6086794 (2000-07-01), Nobutoki et al.
patent: 6094273 (2000-07-01), Asher et al.
patent: 6101300 (2000-08-01), Fan et al.
patent: 6139626 (2000-10-01), Norris et al.
patent: 6144779 (2000-11-01), Binkley et al.
patent: 6147080 (2000-11-01), Bemis et al.
patent: 6174424 (2001-01-01), Wach et al.
patent: 6179912 (2001-01-01), Barbera-Guillem et al.
patent: 6207229 (2001-03-01), Bawendi et al.
patent: 6207392 (2001-03-01), Weiss et al.
patent: 6225198 (2001-05-01), Alivisatos et al.
patent: 6225647 (2001-05-01), Kurtz et al.
patent: 6229633 (2001-05-01), Roberts et al.
patent: 6239355 (2001-05-01), Salafsky
patent: 6268014 (2001-07-01), Eberspacher et al.
patent: 6268041 (2001-07-01), Goldstein
patent: 6277740 (2001-08-01), Goldstein
patent: 6306736 (2001-10-01), Alivisatos et al.
patent: 6313015 (2001-11-01), Lee et al.
patent: 6316715 (2001-11-01), King et al.
patent: 6319426 (2001-11-01), Bawendi

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Methods of forming quantum dots of Group IV semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods of forming quantum dots of Group IV semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods of forming quantum dots of Group IV semiconductor... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3245255

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.