Methods of forming nickel sulfide film on a semiconductor...

Details Methods of forming nickel sulfide film on a semiconductor... Methods of forming nickel sulfide film on a semiconductor...

2011-06-21

2011-06-21

Smith, Matthew S (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S674000, C257SE21575

Reexamination Certificate

active

07964490

ABSTRACT:
Embodiments of the present invention describe a method of forming nickel sulfide layer on a semiconductor device. A nickel sulfide layer is formed on a substrate by alternatingly exposing the substrate to a nickel-containing precursor and a sulfur-containing precursor.

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