Methods of forming indium gallium nitride or aluminum indium gal

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth step with preceding and subsequent diverse...

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438478, 257 94, 257 96, H01L 29205

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active

058519050

ABSTRACT:
Stacked quantum well light emitting diodes include a plurality of stacked active layers of indium gallium nitride, separated by barrier layers of aluminum gallium nitride or aluminum indium gallium nitride, wherein the ratios of indium to gallium differ in at least two of the stacked active layers. Preferably, the differing ratios of indium to gallium are selected to produce emission wavelengths from the stacked active layers, such that the emission wavelengths are combined to produce white light. Controlled amounts of hydrogen gas are introduced into a reaction chamber during formation of indium gallium nitride or aluminum indium gallium nitride to produce high quality indium gallium nitride or aluminum indium gallium nitride which incorporate large percentages of indium and possesses excellent optical and surface properties.

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