Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Reexamination Certificate
2005-02-22
2005-02-22
Nelms, David (Department: 2818)
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
C438S003000, C438S236000
Reexamination Certificate
active
06858443
ABSTRACT:
Ferroelectric capacitors, etc. are disclosed that include a conductive plug that has a base portion of a first cross-sectional width and a protruding portion that protrudes from the base portion and has a second cross-sectional width that is less than the first cross-sectional width. A conductive layer of the ferroelectric capacitor is on the protruding portion opposite the base portion. Related methods are also disclosed.
REFERENCES:
patent: 5350705 (1994-09-01), Brassington et al.
patent: 5499207 (1996-03-01), Miki et al.
patent: 5581436 (1996-12-01), Summerfelt et al.
patent: 5976928 (1999-11-01), Kirlin et al.
patent: 6043526 (2000-03-01), Ochiai
patent: 6051882 (2000-04-01), Avanzino et al.
patent: 6090697 (2000-07-01), Xing et al.
patent: 6177351 (2001-01-01), Beratan et al.
patent: 6291251 (2001-09-01), Nam
patent: 6384443 (2002-05-01), Tsunemine
patent: 10-2002-0058341 (2002-07-01), None
Mizutani et al. (U.S. patent application publication No: U.S. 2002/0014648A1).*
Notice to File a Response/Amendment to the Examination Report for Korean Application No. 2002-17256 (English Translation); dated Feb. 26, 2004.
Lee Moon-Sook
Park Kun-Sang
Myers Bigel & Sibley & Sajovec
Nguyen Thinh T
Samsung Electronics Co,. Ltd.
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