Methods of forming capping layers on reflective materials

Details Methods of forming capping layers on reflective materials Methods of forming capping layers on reflective materials

2005-01-20

2009-06-16

Chea, Thorl (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

C427S166000, C427S294000, C359S848000

Reexamination Certificate

active

07547505

ABSTRACT:
A reflective material is heated to reduce internal stress, and then a capping layer is formed over the reflective material. Heating the reflective material reduces the internal stress of the reflective material. Because the reflective material has reduced internal stress, a more continuous, stable and reliable capping layer is formed that is not subject to stress induced degradation over time due to the relaxing internal stress of the underlying reflective material. Thus, the capping layer remains intact and protects the reflective material residing beneath the capping layer from exposure to contaminants.

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Wolf, S., et al., “Silicon Processing for the VLSI Era: vol. 1—Process Technology,” 2nd Ed., 2000, pp. 109-112, Lattice Press, Sunset Beach, CA.
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Wolf, S., et al., “Silicon Processing for the VLSI Era: vol. 1—Process Technology,” 2nd Ed., 2000, pp. 638-650, Lattice Press, Sunset Beach, CA.

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