Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2006-12-05
2006-12-05
Ho, Tu-Tu (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S763000, C257S758000, C257SE21547
Reexamination Certificate
active
07144803
ABSTRACT:
The present invention includes methods for forming a boron carbo-nitride layer. Additional embodiments include thermal chemical vapor deposition methods for forming a boron carbo-nitride layer. Also integrated circuit devices with a boron carbo-nitride layer are disclosed.
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Ekerdt John G.
Engbrecht Edward R.
Junker Kurt H.
Sun Yang-Ming
Ho Tu-Tu
Myers Bigel Sibley & Sajovec P.A.
Semiconductor Research Corporation
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