Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2005-06-28
2005-06-28
Huff, Mark F. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S394000, C430S005000
Reexamination Certificate
active
06911301
ABSTRACT:
The invention encompasses a radiation-patterning tool. The tool is configured to be utilized to print a pair of structures in a radiation-sensitive material. The tool includes two separate and discrete features, with one of the features corresponding to one of the structures of the pair of structures and the other of the two features correspond to the other of the structures. At least one element is between the features. The at least one element is at least partially transparent to radiation passing through the radiation-patterning tool, but does not correspond to a discrete structure printed in the radiation-sensitive material. The element modifies the structures printed from the pair of features. The invention also includes printing methods and methods of forming aligned structures with radiation-sensitive material.
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Kobayashi, S. et al., “Development of Simplified Process for KrF Excimer Half-Tone Mask with Chrome-Shielding Method(II)”, 20th Annual BACUS Sympos. on Photomask Technology, Proceedings of SPIE vol. 4186 (2001), pp. 801-809.
Dulman H. Daniel
Stanton William A.
Huff Mark F.
Micro)n Technology, Inc.
Mohamedulla Saleha
Wells St. John P.S.
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