Methods of forming aligned structures with...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S394000, C430S005000

Reexamination Certificate

active

06911301

ABSTRACT:
The invention encompasses a radiation-patterning tool. The tool is configured to be utilized to print a pair of structures in a radiation-sensitive material. The tool includes two separate and discrete features, with one of the features corresponding to one of the structures of the pair of structures and the other of the two features correspond to the other of the structures. At least one element is between the features. The at least one element is at least partially transparent to radiation passing through the radiation-patterning tool, but does not correspond to a discrete structure printed in the radiation-sensitive material. The element modifies the structures printed from the pair of features. The invention also includes printing methods and methods of forming aligned structures with radiation-sensitive material.

REFERENCES:
patent: 4902899 (1990-02-01), Lin et al.
patent: 5308721 (1994-05-01), Garofalo et al.
patent: 5563009 (1996-10-01), Bae
patent: 5725973 (1998-03-01), Han et al.
patent: 5827625 (1998-10-01), Lucas et al.
patent: 6312854 (2001-11-01), Chen et al.
patent: 6465138 (2002-10-01), Stanton
Kobayashi, S. et al., “Development of Simplified Process for KrF Excimer Half-Tone Mask with Chrome-Shielding Method”, 19th Annual BACUS Sympos. on Photomask Technology, Monterey, CA, Sep. 1999, SPIE vol. 3873, pp. 288-296.
Kobayashi, S. et al., “Development of Simplified Process for KrF Excimer Half-Tone Mask with Chrome-Shielding Method(II)”, 20th Annual BACUS Sympos. on Photomask Technology, Proceedings of SPIE vol. 4186 (2001), pp. 801-809.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Methods of forming aligned structures with... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods of forming aligned structures with..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods of forming aligned structures with... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3480352

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.