Methods of forming a conductive transparent oxide film layer...

Details Methods of forming a conductive transparent oxide film layer... Methods of forming a conductive transparent oxide film layer...

2010-03-30

2011-10-25

Sarkar, Asok (Department: 2891)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C136S256000, C136S260000, C136S264000, C257SE21159, C438S085000, C438S098000, C438S608000

Reexamination Certificate

active

08043955

ABSTRACT:
Methods are generally provided for forming a conductive oxide layer on a substrate. In one particular embodiment, the method can include sputtering a transparent conductive oxide layer (e.g., including cadmium stannate) on a substrate from a target in a sputtering atmosphere comprising cadmium. The transparent conductive oxide layer can be sputtered at a sputtering temperature greater of about 100° C. to about 600° C. Methods are also generally provided for manufacturing a cadmium telluride based thin film photovoltaic device.

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