Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
Reexamination Certificate
2006-02-14
2006-02-14
Pert, Evan (Department: 2826)
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Total dielectric isolation
C438S409000
Reexamination Certificate
active
06998324
ABSTRACT:
Example methods of fabricating a silicon on insulator substrate are disclosed. One example method may include forming a plurality of trenches on a substrate, forming an insulation layer on the trenches, removing a portion of the insulation layer formed on the trenches to partially expose the substrate, and forming a silicon on insulator film in the substrate via the exposed portions of the substrate.
REFERENCES:
patent: 4643804 (1987-02-01), Lynch et al.
patent: 4982263 (1991-01-01), Spratt et al.
patent: 5217920 (1993-06-01), Mattox et al.
patent: 5767561 (1998-06-01), Frei et al.
patent: 6319333 (2001-11-01), Noble
patent: 6437417 (2002-08-01), Gilton
patent: 6506658 (2003-01-01), D'Arrigo et al.
Dongbu Anam Semiconductor Inc.
Hanley Flight & Zimmerman LLC
Pert Evan
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