Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2008-08-11
2009-11-10
Smith, Zandra (Department: 2822)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S518000, C438S523000, C257S004000, C257SE21002
Reexamination Certificate
active
07615401
ABSTRACT:
A phase-changeable memory device includes a phase-changeable material pattern and first and second electrodes electrically connected to the phase-changeable material pattern. The first and second electrodes are configured to provide an electrical signal to the phase-changeable material pattern. The phase-changeable material pattern includes a first phase-changeable material layer and a second phase-changeable material layer. The first and second phase-changeable material patterns have different chemical, physical, and/or electrical characteristics. For example, the second phase-changeable material layer may have a greater resistivity than the first phase-changeable material layer. For instance, the first phase-changeable material layer may include nitrogen at a first concentration, and the second phase-changeable material layer may include nitrogen at a second concentration that is greater than the first concentration. Related devices and fabrication methods are also discussed.
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Abstract of Korean Patent Application No. 1020014011708 corresponding to 1020010111276, Matsushita Electric Industrial Col, Ltd.
Notice to File Response/Amendment to the Examination Report, Korean App. No. 10-2004-0012358, Dec. 21, 2005.
Notice to File a Response/Amendment to the Examination Report corresponding to Korean Patent Application No. 10-2004-0012358 mailed May 24, 2006.
Bae Jun-Soo
Ha Yong-Ho
Kuh Bong-Jin
Park Jeong-Hee
Park Ju-Chul
Myers Bigel Sibley & Sajovec P.A.
Novacek Christy L
Samsung Electronics Co,. Ltd.
Smith Zandra
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