Methods of fabricating an electronic device and an...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S311000, C430S271100, C430S905000, C525S100000

Reexamination Certificate

active

07727703

ABSTRACT:
A method of fabricating an electronic device is disclosed. The method of fabricating an electronic device comprises providing a substrate. A first conductive layer is formed on the substrate. A silylation polyphenol (PVP) dielectric layer is formed on the first conductive layer. A patterned second conductive layer is formed on the silylation PVP dielectric layer.

REFERENCES:
patent: 4144376 (1979-03-01), Beckmann et al.
patent: 4791171 (1988-12-01), Cunningham
patent: 4867838 (1989-09-01), Brooks et al.
patent: 5008362 (1991-04-01), Wilharm et al.
patent: 5270151 (1993-12-01), Agostino et al.
patent: 5384192 (1995-01-01), Long et al.
patent: 6844131 (2005-01-01), Oberlander et al.
patent: 2004/0002176 (2004-01-01), Xu
patent: 2004/0072436 (2004-04-01), RamachandraRao et al.
patent: 2005/0026080 (2005-02-01), Jung
patent: 2006/0214154 (2006-09-01), Yang et al.
patent: 285025 (1988-10-01), None
patent: 01239545 (1989-09-01), None
patent: 548310 (2003-08-01), None
patent: 250826 (2006-03-01), None
2006 International Conference on Solid State Devices and Materials, Sep. 13-15, 2006, Kanagawa, Japan, pp. 1-24.
Lo et al., Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials, Yokohama, 2006, pp. 923-933.
Müller et al., Journal of Applied Physics 98, pp. 1-3, 2005.
Yoon et al., Journal of the American Chemical Society, vol. 127, No. 29, 2005, pp. 1-8.

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