Methods of fabricating a semiconductor device using a dilute...

Details Methods of fabricating a semiconductor device using a dilute... Methods of fabricating a semiconductor device using a dilute...

2008-02-15

2011-11-15

Sarkar, Asok (Department: 2891)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C257SE21228, C438S706000, C510S175000

Reexamination Certificate

active

08058180

ABSTRACT:
This invention provides methods of fabricating semiconductor devices, wherein an alloy layer is formed on a semiconductor substrate to form a substrate structure, which methods include using an aqueous solution diluted ammonia and peroxide mixture (APM) to perform cleaning and/or wet etching treatment steps on the substrate structure.

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