Methods of depositing germanium carbide

Details Methods of depositing germanium carbide Methods of depositing germanium carbide

1986-05-29

1988-04-05

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419216, 20419226, 20419228, C23C 1434

Patent

active

047356995

ABSTRACT:
A prior art method of depositing Germanium Carbide involves the use of glow discharge techniques which are problematic in that they require high substrate temperatures. Methods embodying the present invention comprise exposing a target of germanium to a plasma comprising an inert gas and a halocarbon gas. The plasma is maintained by means of a radio frequency magnetron electrode which is associated with the target. Atoms and ions of Germanium and Carbon are sputtered onto the substrate in order to deposit the Germanium Carbide.

REFERENCES:
patent: 4309261 (1982-01-01), Harding et al.
patent: 4525417 (1985-06-01), Dimigen et al.
patent: 4591418 (1986-05-01), Snyder

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