Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1996-06-13
1999-10-05
Beck, Shrive
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427574, 427579, H05H 118
Patent
active
059620838
ABSTRACT:
A method of depositing a thin film on a polymer substrate by plasma CVD comprises applying a magnetic field to a plasma generating chamber by activating a magnetic coil placed in the circumference of the plasma generating chamber, the plasma generating chamber having an inlet; introducing a microwave into the plasma generating chamber; introducing an upstream gas into the plasma generating chamber wherein an ECR plasma is generated; vaporizing a feed gas wherein a supply gas is generated and carries the ECR plasma; passing said ECR plasma through a mesh provided between the inlet and a polymer substrate located downstream of the inlet; and depositing a film on the surface of the polymer substrate.
REFERENCES:
patent: 4835005 (1989-05-01), Hirooka et al.
Suzuki Technical Review vol. 21 published on Jan. 31, 1995, pp. 49 to 55, "Deposition of SiO.sub.2 Films on Polymer Substrate Using ECR Plasma and Analysis of Film Quality."
Preprints of the lectures No. 956 published by Jidosha-Gitjutsukai on Sep. 1, 1995, pp. 41 to 44, "Low temperature deposition of SiO.sub.2 thin films on plastics as a hard coating using TEOS/O.sub.2 -plasma." The lectures were given in Beppu, Japan during Sep. 26 to 28, 1995.
Sen-i Gakkai Preprints (1995(F) published by Sen-i Gakkai (The Society of Fiber Science and Technology, Japan) on Oct. 23, 1995, p. F-83, "Low temperature Deposition of SiO.sub.2 films on polymer surfaces by TEOS/O.sub.2 ECR plasma(1)."
The 1995 Fall Meeting of the Materials Research Society was held in Boston, Massachusetts at the end of Nov., 1995.
A booklet with the title "the fourth meeting to present advanced technologies in companies" published by Shizuoka Kagaku-kogaku konwa-kai on Jan. 31, 1996, pp. 25 to 30 "Low temperature Deposition of SiO.sub.2 films on polymer surfaces by TEO/O.sub.2 -ECR plasma." The lectures were given at the faculty of engineering, Shizuoka University in Japan on Jan. 3, 1996.
Extended Abstracts (The 43rd Spring Meeting, 1996) published by the Japan Society of Applied Physics and Related Societies on Mar. 26, 1996, p. 844, "Low temperature Deposition of SiO.sub.2 Using TEOS in ECR plasma (3)." The lectures were given at Tokyo University in Asaka-city, Japan on Mar. 26 to 29, 1996.
K. Sano et al.; Deposition of High Quality SiO.sub.2 Films Using Teos by ECR Plasma, Mat. Res. Soc. Symp. Proc. 396:539-543 (1996).
Hatanaka Yoshinori
Hayashi Shigekazu
Nakanishi Yoichiro
Nomura Masaya
Sano Keiichiro
Beck Shrive
Chen Bret
Suzuki Motor Corporation
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