Methods of defining regions of crystalline material of the group

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156662, 156904, 148175, 148187, 427 87, 427122, 427259, C23F 102, B05D 512

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040533506

ABSTRACT:
A thin coating of carbon is used as a mask to define regions of a crystalline material of the group III-V compounds. A carbon mask is coated on portions of a surface of a substrate and the masked substrate contacted with the group III-V material to deposit the crystalline material only on the portions of the surface of the substrate not covered with the masking coating. The group III-V material will not be deposited on the carbon coating, since it is incapable of nucleating the growth of the crystalline material. Accordingly, a defined region of the crystalline material is formed. The carbon masking coating can also be used as a mask for etching cavities or recesses in a substrate of the group III-V material.

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V. Y. Doo, IBM Technical Disclosures Bulletin, vol. 9, No. 7, Dec. 1966, pp. 920-921.

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