Methods of calibrating and controlling stepper exposure...

Details Methods of calibrating and controlling stepper exposure... Methods of calibrating and controlling stepper exposure...

2005-12-06

2005-12-06

Pham, Hoa Q. (Department: 2877)

Optics: measuring and testing

Dimension

Thickness

C430S030000, C438S016000

Reexamination Certificate

active

06972853

ABSTRACT:
The present invention is generally directed to various methods of stepper exposure processes and tools, and system for accomplishing same. In one embodiment, the method comprises forming a grating structure comprised of a plurality of photoresist features above a semiconducting substrate, measuring at least one characteristic of at least one of the photoresist features at a plurality of locations within the grating structure, and determining if the measured characteristic of the photoresist features varies across the grating structure.

REFERENCES:
patent: 4082453 (1978-04-01), Knop
patent: 5164790 (1992-11-01), McNeil et al.
patent: 5300786 (1994-04-01), Brunner et al.
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5877860 (1999-03-01), Borden
patent: 5880838 (1999-03-01), Marx et al.
patent: 6051348 (2000-04-01), Marinaro et al.
patent: 6081334 (2000-06-01), Grimbergen et al.
patent: 6245584 (2001-06-01), Marinaro et al.
patent: 6433878 (2002-08-01), Niu et al.
patent: 6479200 (2002-11-01), Stirton
patent: 6639663 (2003-10-01), Markle et al.
patent: 6643008 (2003-11-01), Stirton et al.
U.S Appl. No. 09/879,338, filed Jun. 11, 2001, Stirton et al.

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