Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2007-04-24
2007-04-24
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S041000, C117S002000, C117S084000, C977S721000, C977S742000
Reexamination Certificate
active
10738176
ABSTRACT:
A semiconductor nanowire is grown laterally. A method of growing the nanowire forms a vertical surface on a substrate, and activates the vertical surface with a nanoparticle catalyst. A method of laterally bridging the nanowire grows the nanowire from the activated vertical surface to connect to an opposite vertical surface on the substrate. A method of connecting electrodes of a semiconductor device grows the nanowire from an activated device electrode to an opposing device electrode. A method of bridging semiconductor nanowires grows nanowires between an electrode pair in opposing lateral directions. A method of self-assembling the nanowire bridges the nanowire between an activated electrode pair. A method of controlling nanowire growth forms a surface irregularity in the vertical surface. An electronic device includes a laterally grown nano-scale interconnection.
REFERENCES:
patent: 6297063 (2001-10-01), Brown et al.
patent: 6791338 (2004-09-01), Bratkovski et al.
patent: 6841142 (2005-01-01), Tenne et al.
patent: 2002/0014667 (2002-02-01), Shin et al.
patent: 2002/0117659 (2002-08-01), Lieber et al.
patent: 2003/0165418 (2003-09-01), Ajayan et al.
patent: 2004/0075464 (2004-04-01), Samuelson et al.
patent: 2004/0079278 (2004-04-01), Kamins et al.
patent: 2004/0175844 (2004-09-01), Yang et al.
patent: 2005/0011431 (2005-01-01), Samuelson et al.
patent: 1018758 (2000-07-01), None
patent: WO 01/44796 (2001-06-01), None
patent: WO 03/052181 (2003-06-01), None
K. Haraguchi, K. Hiruma, T. Katsuyama, K. Tominaga, M. Shirai, and T. Shimada, “Self-organized fabrication of planar GaAs nanowhisker arrays,” Appl. Phys. Lett., vol. 69, pp. 386-387 (Jul. 15, 1996).
T. Shimada, K. Hiruma, M. Shirai, M. Yazawa, K. Haraguchi. T. Sato, M. Matsui, and T. Katsuyama, “Size, position and direction control on GaAs and InAs nanowhisker growth,” Superlattices and Microstructures, vol. 24, pp. 453-458 (1998).
K. Haraguchi, K. Hiruma, K. Hosomi, M. Shirai, and T. Katsuyama, “Growth mechanism of planar-type GaAs nanowhiskers,” J. Vac. Sci. Technol. B, vol. 15, pp. 1685-1687 (Sep./Oct. 1997).
A. Tilke, R.H. Blick, H. Lorenz, J.P. Kotthaus and D.A. Wharam, “Coulomb blockade in quasimetallic silicon-on-insulator nanowires”, Applied Physics Letters, vol. 75, No. 23, Dec. 6, 1999, pp. 3704-3706.
A.T. Tilke, F.C. Simmel, H. Lorenz, R.H. Blick and J. P. Kotthaus, “Quantum intererence in a one-dimensional silicon nanowire”, Physical Review B, vol. 68, 075311 (2003), pp. 075311-1 to 075311-6.
Yi Cui and Charles M. Lieber, “Functional Nanoscale Electronic Devices Assembled Using Silicon Nanowire Building Blocks”, Science, vol. 291, Feb. 2, 2001, pp. 851-853.
Westwater, J et al—“Growth of Silicon Nanowires Via Au-Silane VLS Reaction”—Journal of Vacuum Science and Technology Part B—vol. 15 No. 3 May 1995—pp. 554-557.
Islam M. Saif
Kamins Theodore I.
Sharma Shashank
Ahmed Shamim
Hewlett--Packard Development Company, L.P.
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