Methods for treating semiconductor wafers

Details Methods for treating semiconductor wafers Methods for treating semiconductor wafers

1998-06-12

1999-10-26

Warden, Jill

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 1, 134 991, 438750, B08B 312, B08B 308

Patent

active

059721235

ABSTRACT:
The present invention presents methods for, inter alia, cleaning and etching semiconductor wafers with a solution containing ammonium fluoride and control of the process used for preparing such a solution at its point of use.

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