Methods for silicon electrode assembly etch rate and etch...

Details Methods for silicon electrode assembly etch rate and etch... Methods for silicon electrode assembly etch rate and etch...

2004-12-23

2008-10-28

Nguyen, Dung Van (Department: 3723)

Abrading

Abrading process

Combined abrading

C451S037000, C451S028000

Reexamination Certificate

active

07442114

ABSTRACT:
Methods for cleaning an electrode assembly, which can be used for etching a dielectric material in a plasma etching chamber after the cleaning, comprise polishing a silicon surface of the electrode assembly, preferably to remove black silicon contamination therefrom.

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