Methods for providing uniformity in plasma-assisted material...

Details Methods for providing uniformity in plasma-assisted material... Methods for providing uniformity in plasma-assisted material...

2007-05-29

2007-05-29

Ahmed, Shamim (Department: 1765)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S008000, C427S585000, C204S298020, C204S298110, C118S7230AN, C156S345480

Reexamination Certificate

active

10396990

ABSTRACT:
A method for providing uniformity in plasma-assisted material processes. A shielding plate is implemented within a plasma chamber above a substrate. The dimensions, geometry, and location of the shielding plate are optimized to generate a desired ion flux in a plasma-assisted material process conducted in a plasma chamber.

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