Methods for producing thin films on substrates by plasma CVD

Details Methods for producing thin films on substrates by plasma CVD Methods for producing thin films on substrates by plasma CVD

2007-12-04

2007-12-04

Chen, Bret (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S577000, C427S237000

Reexamination Certificate

active

10766806

ABSTRACT:
Methods are provided to form a thin film reproducibly in a process for forming the thin film on the inner wall surface facing a space formed in a substrate by plasma CVD. A thin film is produced on an inner wall surface of a substrate facing a space formed in the substrate. The substrate is contained in a chamber for plasma CVD process. A gas for plasma reaction is then flown into the space and a pulse voltage is applied on the substrate without substantially applying a direct bias voltage on the substrate to form the thin film on the inner wall surface.

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