Methods for producing pattern-forming body

Details Methods for producing pattern-forming body Methods for producing pattern-forming body

2007-08-07

2007-08-07

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S302000, C430S306000, C430S325000, C430S326000, C430S005000, C430S009000

Reexamination Certificate

active

10272096

ABSTRACT:
A method of producing a pattern-forming body with high accuracy with no need for a post-exposure treatment and without allowing any photocatalyst to remain in the resultant pattern-forming body and whereby any problematic effect of the photocatalyst in the pattern-forming body is eliminated. The method includes providing a photocatalyst-containing layer-sided substrate and a pattern-forming body substrate having a characteristic-changeable layer, which is changed by the effect of the photocatalyst in the photocatalyst-containing layer, and a light-shading part formed as a pattern in such a manner that the photocatalyst-containing layer and the characteristic-changeable layer are brought into contact with each other, followed by exposure on the side of the pattern-forming body substrate to change the characteristics of the characteristic-changeable layer of the exposed part, followed by removing the photocatalyst-containing layer-sided substrate.

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Abraham Ulman, “Formation and Structure of Self-Assembled Monolayers”, Chemical Review, 96, pp. 1533-1554 (1996).
Tokuji Miyashita et al., “LB-Film—Toward Nano-technology for Fabrication of Soft Nano-devices”, Kobunshi, vol. 50, Sep. issue, pp. 644-647 (2001).
Paula T. Hammond, “Recent Explorations in electrostatic multilayer thin film assembly”, Current Opinion in Colloid & Interface Science, 4, pp. 430-442 (2000).

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