Methods for processing a substrate with a flow controlled...

Details Methods for processing a substrate with a flow controlled... Methods for processing a substrate with a flow controlled...

2011-01-04

2011-01-04

Barr, Michael (Department: 1711)

Cleaning and liquid contact with solids

Processes

With treating fluid motion

C134S018000, C134S042000, C134S902000

Reexamination Certificate

active

07862663

ABSTRACT:
A method for processing a substrate is provided which includes applying fluid onto a surface of the substrate from a portion of a plurality of inlets and removing at least the fluid from the surface of the substrate where the removing being processed as the fluid is applied to the surface. The applying the fluid and the removing the fluid forms a segment of a fluid meniscus on the surface of the substrate.

REFERENCES:
patent: 6398975 (2002-06-01), Mertens et al.
patent: 6988327 (2006-01-01), Garcia et al.
patent: 7143527 (2006-12-01), Garcia et al.
patent: 7329321 (2008-02-01), Yun et al.
patent: 7387689 (2008-06-01), de Larios et al.
patent: 2002/0023671 (2002-02-01), Mitsumori et al.

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