Methods for preparing titania coatings by plasma CVD at...

Details Methods for preparing titania coatings by plasma CVD at... Methods for preparing titania coatings by plasma CVD at...

2003-07-30

2009-10-06

Chen, Bret (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S573000, C427S576000, C427S255360

Reexamination Certificate

active

07597940

ABSTRACT:
A method for deposition of titania, and titania-containing, thin films by CVD, using an atmospheric pressure glow discharge plasma as a major source of reaction, which leads to film properties, and film growth rates, normally only achievable (by atmospheric pressure CVD) with significantly higher substrate temperatures.

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