Methods for preparing low scatter optical coatings

Details Methods for preparing low scatter optical coatings Methods for preparing low scatter optical coatings

1996-03-19

1997-09-23

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419223, 20419227, 20429811, C23C 1434

Patent

active

056700300

ABSTRACT:
The present invention is directed to a sputtering method for preparing optical coatings having low light scattering characteristics by controlling the angle of incidence of the material being sputtered without significantly reducing the coating efficiency of the sputtering process. The angle of incidence is controlled by reducing the collision scattering of the material being sputtered and by intercepting the sputtered material that would without interception arrive at the surface to be coated at high angles of incidence. The collision scattering is reduced by utilizing a sputtering gas that has a mass less than the mass of the material being sputtered.

REFERENCES:
patent: 5427665 (1995-06-01), Hartig et al.
patent: 5507931 (1996-04-01), Yang

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