Methods for measuring optical system, and method and apparatus f

Details Methods for measuring optical system, and method and apparatus f Methods for measuring optical system, and method and apparatus f

1993-11-23

1995-05-30

Berman, Jack I.

Radiant energy

Irradiation of objects or material

2504922, 356358, 355 55, H01L 2100, G01B 902

Patent

active

054204364

ABSTRACT:
A technique and exposure apparatus measures, with a high degree of accuracy, figure and placement errors of individual optical elements constituting optics embedded inside of an exposure apparatus or the like, with the optics kept in an embedded state as they are. The system measures the distribution of wavefront distortions in the optics while changing the positions of a light source and an image point inside an exposure field of the optics being observed. Optimal displacements of reflective surfaces constituting the optics are then found by calculation based on the measured distribution of wave-front distortions. Finally, the positions of the reflective surfaces are corrected in accordance with the calculated optimal displacements. The positions of the reflective surfaces are corrected by individually controlling displacements output by a plurality of actuators attached to each reflective surface and by mechanically modifying appropriate portions of the reflective surfaces.

REFERENCES:
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patent: 4704033 (1987-11-01), Fay et al.
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patent: 4904084 (1990-02-01), Geary
patent: 5192982 (1993-03-01), Lapucci
patent: 5231467 (1993-07-01), Takeuchi et al.
patent: 5298971 (1994-03-01), Huang et al.
Applied Optics, vol. 13, No. 11, Nov. 1974, "Digital Wavefront Measuring Interferometer for Testing Optical Surfaces and Lenses", J. H. Bruning et al. pp. 2693-2703.

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