Methods for measuring mean-to-target (MTT) based on pattern...

Details Methods for measuring mean-to-target (MTT) based on pattern... Methods for measuring mean-to-target (MTT) based on pattern...

2008-11-24

2011-11-08

Doan, Nghia (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Integrated circuit design processing

Logic design processing

C716S050000, C716S051000, C716S052000, C716S053000, C716S054000, C716S055000, C716S107000, C716S111000, C430S005000, C430S030000

Reexamination Certificate

active

08056032

ABSTRACT:
Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT. Related methods of correcting a photomask are also provided herein.

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