Methods for making microlens arrays

Details Methods for making microlens arrays Methods for making microlens arrays

1993-03-01

1994-02-15

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156626, 156657, 1566591, 156663, 252 791, B44C 122, C03C 1500, C03C 2506

Patent

active

052863387

ABSTRACT:
During a reactive ion etching process (FIG. 5) for making lens elements (15, FIG. 4) in a silica substrate (12), the gas constituency in the reactive ion etch chamber is changed to adjust the curvature of lens elements formed in the silica substrate and to reduce the aberrations of such lens elements. For example, two gases, CHF.sub.3 and oxygen may be supplied to the reactive ion etch chamber and, during the reactive ion etch process, the proportion of oxygen is significantly reduced, which reduces the aberrations of the lens elements formed by the process.

REFERENCES:
patent: 4813762 (1989-03-01), Leger et al.
patent: 5135590 (1992-08-01), Basavanhally et al.
"A Process for Monolithic Fabrication of Microlenses on Integrated Circuits," Z. D. Popovic, SPIE, vol. 898 Miniature Optics and Lasers (1988), pp. 23-25.
"Ion-Beam Etching of InP and Its Applications to the Fabrication of High Radiance InGaAsP/InP Light Emitting Diodes", O. Wada, Journal of Electrochemical Society: Solid-State Science and Technology, Oct. 1984, vol. 131, No. 10, pp. 2373-2380.
"OSLO.RTM. Series II and III Operating Manual," First Edition, Copyright 1991, Sinclair Optics Inc., Fairport, New York, pp. 3-6-3-8.

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