Methods for forming roughened surfaces and applications thereof

Details Methods for forming roughened surfaces and applications thereof Methods for forming roughened surfaces and applications thereof

2006-04-28

2009-02-17

Le, Dung A. (Department: 2818)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

Insulated gate formation

C438S586000, C438S584000, C438S678000

Reexamination Certificate

active

07491634

ABSTRACT:
Methods of forming a roughened metal surface on a substrate are provided, along with structures comprising such roughened surfaces. In preferred embodiments roughened surfaces are formed by selectively depositing metal or metal oxide on a substrate surface to form discrete, three-dimensional islands. Selective deposition may be obtained, for example, by modifying process conditions to cause metal agglomeration or by treating the substrate surface to provide a limited number of discontinuous reactive sites. The roughened metal surface may be used, for example, in the manufacture of integrated circuits.

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