Methods for forming dielectrics and metal electrodes

Details Methods for forming dielectrics and metal electrodes Methods for forming dielectrics and metal electrodes

2005-06-29

2008-10-07

Le, Dung A. (Department: 2818)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S216000, C438S287000, C438S162000

Reexamination Certificate

active

07432139

ABSTRACT:
A method for forming a semiconductor structure, the method including forming in a processing chamber a dielectric layer over a substrate; and subsequently forming, in the same processing chamber and without removing the substrate therefrom, an electrode layer directly over and in contact with the dielectric layer.

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