Methods for controlling formation of deposits in a...

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S255280

Reexamination Certificate

active

07118781

ABSTRACT:
A method for controlling parasitic deposits in a deposition system for depositing a film on a substrate, the deposition system defining a reaction chamber for receiving the substrate and including a process gas in the reaction chamber and an interior surface contiguous with the reaction chamber, includes flowing a buffer gas between the interior surface and at least a portion of the process gas to form a gas barrier layer such that the gas barrier layer inhibits contact between the interior surface and components of the process gas.

REFERENCES:
patent: 4748135 (1988-05-01), Frijlink
patent: 4756927 (1988-07-01), Black et al.
patent: 4778693 (1988-10-01), Drozdowicz et al.
patent: 4800105 (1989-01-01), Nakayama et al.
patent: 4924807 (1990-05-01), Nakayama et al.
patent: 4989541 (1991-02-01), Mikoshiba et al.
patent: 5005519 (1991-04-01), Egermeier et al.
patent: 5027746 (1991-07-01), Frijlink
patent: 5108540 (1992-04-01), Frijlink
patent: 5334277 (1994-08-01), Nakamura
patent: 5433169 (1995-07-01), Nakamura
patent: 5449535 (1995-09-01), Streater
patent: 5620524 (1997-04-01), Fan et al.
patent: 5669976 (1997-09-01), Yuuki et al.
patent: 5674320 (1997-10-01), Kordina et al.
patent: 5695567 (1997-12-01), Kordina et al.
patent: 5704985 (1998-01-01), Kordina et al.
patent: 5759263 (1998-06-01), Nordell et al.
patent: 5792257 (1998-08-01), Kordina et al.
patent: 5851589 (1998-12-01), Nakayama et al.
patent: 5879462 (1999-03-01), Kordina et al.
patent: 6030661 (2000-02-01), Kordina et al.
patent: 6039812 (2000-03-01), Ellison et al.
patent: 6048398 (2000-04-01), Vehanen et al.
patent: 6093253 (2000-07-01), Löfgren et al.
patent: 6179913 (2001-01-01), Solomon et al.
patent: 6299683 (2001-10-01), Rupp et al.
patent: 6402849 (2002-06-01), Kwag et al.
patent: 0 959 150 (1999-11-01), None
patent: 53 126867 (1978-11-01), None
patent: 59209643 (1983-05-01), None
patent: 2002 170774 (2002-06-01), None
patent: WO 98/44164 (1998-10-01), None
patent: WO 02/38839 (2002-05-01), None
International Search Report and Written Opinion of the International Searching Authority for Application No. PCT/US2004/004943 mailed on May 11, 2005.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Methods for controlling formation of deposits in a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods for controlling formation of deposits in a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for controlling formation of deposits in a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3717746

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.