Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
Reexamination Certificate
2006-09-05
2006-09-05
Picard, Leo (Department: 2125)
Semiconductor device manufacturing: process
Radiation or energy treatment modifying properties of...
C700S109000, C700S110000, C700S121000, C073S760000
Reexamination Certificate
active
07101816
ABSTRACT:
Methods for adaptive real time control of a system for thermal processing substrates, such as semiconductor wafers and display panels. Generally, the method includes creating a dynamic model of the thermal processing system, incorporating wafer bow in the dynamic model, coupling a diffusion-amplification model into the dynamic thermal model, creating a multivariable controller, parameterizing the nominal setpoints, creating a process sensitivity matrix, creating intelligent setpoints using an efficient optimization method and process data, and establishing recipes that select appropriate models and setpoints during run-time.
REFERENCES:
patent: 5305417 (1994-04-01), Najm et al.
patent: 5871805 (1999-02-01), Lemelson
patent: 6100506 (2000-08-01), Colelli et al.
patent: 6127288 (2000-10-01), Kiyama
patent: 6169271 (2001-01-01), Savas et al.
patent: 6344232 (2002-02-01), Jones et al.
patent: 6373033 (2002-04-01), de Waard et al.
patent: 6801295 (2004-10-01), Inomata et al.
patent: 2003/0173346 (2003-09-01), Renken
patent: 2003/0199108 (2003-10-01), Tanaka et al.
patent: 2004/0056017 (2004-03-01), Renken
patent: 2005/0053850 (2005-03-01), Askebjer et al.
European Patent Office,PCT International Search Report, Mailing Date: May 11, 2005 (4 pages).
Kaushal Sanjeev
Pandey Pradeep
Sugishima Kenji
Masinick Michael D.
Picard Leo
Wood Herron & Evans L.L.P.
LandOfFree
Methods for adaptive real time control of a thermal... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Methods for adaptive real time control of a thermal..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for adaptive real time control of a thermal... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3566723