Methods, assemblies and systems for inspecting a photomask

Details Methods, assemblies and systems for inspecting a photomask Methods, assemblies and systems for inspecting a photomask

2007-10-01

2010-10-05

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237400, C356S237200

Reexamination Certificate

active

07808629

ABSTRACT:
A method of inspecting a photomask, the method comprising, inspecting at least a portion of the photomask to provide a location of defects having with a first resolution, determining at least one defect region in the location of the defects, the defect region having a defect therein, and imaging the at least one defect region to provide a defect image having a second resolution that is finer than the first resolution.

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