Methods and systems involving electrically programmable fuses

Details Methods and systems involving electrically programmable fuses Methods and systems involving electrically programmable fuses

2007-08-30

2010-12-14

Fahmy, Wael M (Department: 2891)

Active solid-state devices (e.g., transistors, solid-state diode

Integrated circuit structure with electrically isolated...

Passive components in ics

C257S208000, C257S209000, C257S530000, C438S132000, C337S160000

Reexamination Certificate

active

07851885

ABSTRACT:
An electrically programmable fuse comprising a cathode member, an anode member, and a link member, wherein the cathode member, the anode member, and the link member each comprise one of a plurality of materials operative to localize induced electromigration in the programmable fuse.

REFERENCES:
patent: 4914055 (1990-04-01), Gordon et al.
patent: 5272666 (1993-12-01), Tsang et al.
patent: 5412593 (1995-05-01), Magel et al.
patent: 5621691 (1997-04-01), Park
patent: 5903041 (1999-05-01), La Fleur et al.
patent: 5969404 (1999-10-01), Bohr et al.
patent: 6096580 (2000-08-01), Iyer et al.
patent: 6323534 (2001-11-01), Marr et al.
patent: 6323535 (2001-11-01), Iyer et al.
patent: 6337507 (2002-01-01), Bohr et al.
patent: 6346846 (2002-02-01), Bertin et al.
patent: 6372652 (2002-04-01), Verma et al.
patent: 6388305 (2002-05-01), Bertin et al.
patent: 6396120 (2002-05-01), Bertin et al.
patent: 6396121 (2002-05-01), Bertin et al.
patent: 6433404 (2002-08-01), Iyer et al.
patent: 6498056 (2002-12-01), Motsiff et al.
patent: 6501107 (2002-12-01), Sinclair et al.
patent: 6507087 (2003-01-01), Yu
patent: 6512284 (2003-01-01), Schulte et al.
patent: 6570207 (2003-05-01), Hsu et al.
patent: 6577156 (2003-06-01), Anand et al.
patent: 6617914 (2003-09-01), Kothandaraman
patent: 6621324 (2003-09-01), Fifield et al.
patent: 6624031 (2003-09-01), Abadeer et al.
patent: 6624499 (2003-09-01), Kothandaraman et al.
patent: 6661330 (2003-12-01), Young
patent: 6750530 (2004-06-01), Klaasen et al.
patent: 6751137 (2004-06-01), Park et al.
patent: 6753590 (2004-06-01), Fifield et al.
patent: 6794726 (2004-09-01), Radens et al.
patent: 6853049 (2005-02-01), Herner
patent: 6879021 (2005-04-01), Fitfield et al.
patent: 6882027 (2005-04-01), Brintzinger et al.
patent: 6927997 (2005-08-01), Lee et al.
patent: 6944054 (2005-09-01), Rueckes et al.
patent: 6972614 (2005-12-01), Anderson, II et al.
patent: 7087499 (2006-08-01), Rankin et al.
patent: 7254078 (2007-08-01), Park et al.
patent: 7382036 (2008-06-01), Nowak et al.
patent: 2004/0004268 (2004-01-01), Brown et al.
patent: 2004/0222491 (2004-11-01), Ito et al.
patent: 2005/0124097 (2005-06-01), Xiang
patent: 2005/0247997 (2005-11-01), Chung et al.
patent: 2005/0277232 (2005-12-01), Wu et al.
patent: 2006/0012458 (2006-01-01), Leigh et al.
patent: 2006/0081959 (2006-04-01), Dondero et al.
patent: 2006/0102982 (2006-05-01), Park et al.
patent: 2006/0278932 (2006-12-01), Kothandaraman et al.
patent: 2007/0029576 (2007-02-01), Nowak et al.
patent: 2007/0099326 (2007-05-01), Hsu et al.
patent: 2007/0205485 (2007-09-01), Hsu et al.
patent: 2007/0252237 (2007-11-01), Ko et al.
patent: 2008/0029844 (2008-02-01), Adkisson et al.
patent: 2008/0069629 (2008-03-01), Beuselinck et al.
patent: 2008/0157201 (2008-07-01), Marshall
patent: 2008/0217733 (2008-09-01), Iyer et al.
patent: WO2004100271 (2004-11-01), None
patent: WO2006028946 (2006-03-01), None
Kothandaraman et al., “Electrically Programmable Fuse (eFUSE) Using Electromigration in Silicides,” IEEE Electron Device Letters, vol. 23, No. 9, Sep. 2002.

Affiliated with

Also associated with

Rating

Methods and systems involving electrically programmable fuses does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods and systems involving electrically programmable fuses, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods and systems involving electrically programmable fuses will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4214780