Methods and systems for process monitoring using x-ray emission

Details Methods and systems for process monitoring using x-ray emission Methods and systems for process monitoring using x-ray emission

2007-12-25

2007-12-25

Berman, Jack I. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S305000, C250S306000, C250S307000, C250S311000, C378S045000, C378S044000, C378S046000, C378S049000, C378S058000

Reexamination Certificate

active

10530159

ABSTRACT:
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.

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patent: 6855930 (2005-02-01), Okuda et al.
patent: WO 01 44794 (2001-06-01), None
International Search Report, PCT/US2003/03237, Mar. 18, 2004, 5pp.
Willich, P., Bethke, R., Performance and limitations of electron probe microanalysis applied to the characterization of coatings and layered structures, Jan. 16, 1995, 4 pp.

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