Methods and systems for generating information to be used...

Data processing: measuring – calibrating – or testing – Testing system – Including program set up

Reexamination Certificate

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C702S127000, C702S155000, C702S134000, C378S137000, C356S237400, C356S237500

Reexamination Certificate

active

08000922

ABSTRACT:
Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.

REFERENCES:
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patent: 10-2006-0128277 (2006-12-01), None
U.S. Appl. No. 60/974,030 (Bhaskar et al.) entitled Systems and Methods for Creating Persistent Data for a Wafer and for Using Persistent Data for Inspection-Related Functions filed on Sep. 20, 2007.
U.S. Appl. No. 11/859,342 (Chen et al.) entitled Computer-Implemented Methods, Carrier Media, and Systems for Creating a Defect Sample for Use in Selecting One or More Parameters of an Inspection Recipe filed Sep. 21, 2007.
International Search Report and Written Opinion for PCT/US2009/045127, mailed Nov. 20, 2009.
International Preliminary Report on Patentability for PCT/US2009/045127 mailed Nov. 30, 2010.

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