Optics: measuring and testing – By polarized light examination – Of surface reflection
Reexamination Certificate
2001-09-20
2008-03-25
Stafira, Michael P. (Department: 2886)
Optics: measuring and testing
By polarized light examination
Of surface reflection
Reexamination Certificate
active
07349090
ABSTRACT:
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a property of a specimen prior to, during, or subsequent to lithography. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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Brown Kyle A.
Bultman Gary
Fielden John
Levy Ady
Nikoonahad Mehrdad
Baker & McKenzie LLP
KLA-Tencor Technologies Corp.
Stafira Michael P.
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