Methods and processing systems for using a gas cluster ion...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S492300, C204S192100, C204S192300, C204S192340, C257S583000

Reexamination Certificate

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07550749

ABSTRACT:
Embodiments of an apparatus and methods for offsetting systematic non-uniformities using a gas cluster ion beam are generally described herein. Other embodiments may be described and claimed.

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