Methods and developer for developing a positive photoresist

Details Methods and developer for developing a positive photoresist Methods and developer for developing a positive photoresist

1992-06-01

1999-05-11

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

G03F7/32

Patent

active

059027185

ABSTRACT:
Methods for developing a positive photoresist comprise providing a positive photoresist and developing the positive photoresist with a developer comprising a quaternary ammonium hydroxide and a quaternary ammonium halogenide. The positive photoresist has an unexposed portion dissolution rate with a 2.38 weight % aqueous solution of tetramethyl ammonium hydroxide of about 1 .ANG./sec or less. The quaternary ammonium halogenide is of the formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 are selected from the group consisting of ethyl, methyl, hydroxy methyl, hydroxy ethyl and hydrogen, and X is a halogen atom.

REFERENCES:
patent: 3607271 (1971-09-01), Hilhorst et al.
patent: 4423138 (1983-12-01), Guild
patent: 4873177 (1989-10-01), Tanaka et al.
patent: 4914006 (1990-04-01), Kato et al.

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